Image placement errors in x-ray masks induced by changes in resist stress during electron-beam writing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4354-4358

  Acosta, R E ^a   Puisto, Denise ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001682793     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589052     Document Type: Article

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