Position measurement of high energy e-beams for pattern placement improvement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2723, Issue , 1996, Pages 91-101

  Perkins, F Keith ^a   McCarthy, Daniel ^a   Marrian, Christie R K ^a   Peckerar, Martin C ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

Electron beam lithography; Fourier transform; Membrane; Pattern placement; Position detector; X ray masks

Indexed keywords

ALGORITHMS; DIFFRACTION GRATINGS; ELECTRON SCATTERING; FOURIER TRANSFORMS; LIGHT MODULATION; MASKS; MEMBRANES; OPTICAL MULTILAYERS; PATTERN RECOGNITION; POSITION MEASUREMENT; SCHOTTKY BARRIER DIODES; X RAY LITHOGRAPHY;

POSITION DETECTOR;

ELECTRON BEAM LITHOGRAPHY;

EID: 0030316313     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240459     Document Type: Conference Paper

References (9)

1. Combining and matching optical, electron-beam, and x-ray lithographies in the fabrication of Si complementary metal-oxide-semiconductor circuits with 0.1 and sub-0.1 μm features
2. Electron energy loss in thin metal films
3. Fourier analysis with unequally spaced data