Extendibility of synchrotron radiation lithography to the sub-100 nm region

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4294-4297

  Deguchi, Kimiyoshi ^a   Miyoshi, Kazunori ^a   Oda, Masatoshi ^a   Matsuda, Tadahito ^a   Ozawa, Akira ^b   Yoshihara, Hideo ^b  

^a NTT CORPORATION   (Japan)

^b NTT Advanced Technology Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000728231     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588593     Document Type: Article

References (23)

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