Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4308-4313

  Laird, D L ^a   Engelstad, R L ^a   Puisto, D M ^b,e   Acosta, R E ^c   Cummings, K D ^d   Johnson, W A ^d  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b IBM MICROELECTRONICS   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

^d MOTOROLA INC   (United States)

^e LOCKHEED MARTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343096932     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589042     Document Type: Article

References (5)

1. R. Acosta et al., J. Vac. Sci. Technol. B, these proceedings
2. D. Laird et al., J. Vac. Sci. Technol. B 11, 2953 (1993).
3. H. M. Westergaard, J. Appl. Mech. 6, 49 (1939).
4. M. F. Laudon et al., Micro Nano Eng. (to be published).
5. W. J. Dauksher et al., J. Vac. Sci. Technol. B 12, 3990 (1994).