A principle of deposition of ultra low and uniform stress absorber for X-ray mask

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7575-7579

  Kitamura, Kaeko ^a   Yabe, Hideki ^a   Sasaki, Kei ^a   Ami, Shigeto ^a   Kise, Koji ^a   Aya, Sunao ^a   Marumoto, Kenji ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Absorber; Placement accuracy; Sputtering; Stress control; W Ti; X ray mask

Indexed keywords

AMORPHOUS FILMS; MASKS; SPUTTER DEPOSITION; STRESS CONCENTRATION; SUBSTRATES; TUNGSTEN ALLOYS;

STRESS ABSORBERS; X RAY MASKS;

X RAY LITHOGRAPHY;

EID: 0031360953     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7575     Document Type: Article

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