X-ray phase-mask: Nanostructures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 183-192

  Chen, Zheng ^a   Leonard, Quinn ^a   Khan, Mumit ^a   Cerrina, Franco ^a  

^a Center for X ray Lithography   (United States)

Author keywords

Aerial image; Log exposure gap diagram; Nanostructures; Phase mask; Process latitude; Quantum dots; Sub 0. 1 m

Indexed keywords

ANTENNAS; ASPECT RATIO; MASKS; MOS DEVICES; NANOSTRUCTURES; PHASE SHIFTERS; POLYMETHYL METHACRYLATES; SEMICONDUCTOR QUANTUM DOTS; SILICON CARBIDE; SILICON COMPOUNDS; X RAY LITHOGRAPHY;

AERIAL IMAGES; EXPERIMENTAL DEMONSTRATIONS; HIGH RESOLUTION; LOG EXPOSURE-GAP DIAGRAM; PHASE MASKS; PHASE-SHIFTING MASK; PRINTED PATTERNS; PROCESS LATITUDES;

X RAYS;

EID: 0342662636     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275775     Document Type: Conference Paper

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