Characterisation of process variables for ultraviolet assisted injection liquid source chemical vapour deposition (UVILS-CVD) of tantalum pentoxide films

Materials Research Society Symposium - Proceedings

Volumn 567, Issue , 1999, Pages 509-514

  Beechinor, J T ^a   Mooney, M B ^b   Kelly, P V ^a   Crean, G M ^b   Zhang, J Y ^c   Boyd, I W ^c   Paillous, M ^a   Jimenez, C ^a,c   Senateur J P ^c  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b UNIVERSITY COLLEGE LONDON   (United Kingdom)

^c GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LOW TEMPERATURE OPERATIONS; NITROGEN OXIDES; PHYSICAL PROPERTIES; REFRACTIVE INDEX; SEMICONDUCTING SILICON; TANTALUM COMPOUNDS; THERMAL EFFECTS; THICKNESS MEASUREMENT; ULTRAVIOLET DEVICES;

DEPOSITION PARAMETERS; TANTALUM PENTOXIDE FILMS;

SEMICONDUCTING FILMS;

EID: 0033319192     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-567-509     Document Type: Conference Paper

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