Infrared Spectroscopic Study of Mercury-Sensitized Photo-CVD Silicon Oxide

Japanese Journal of Applied Physics

Volumn 29, Issue 6 R, 1990, Pages 997-1003

  Lan, W H ^a   Tu, S L ^a   Yang, S J ^b   Huang, K F ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Infrared absorption; Photochemical vapor deposition (photo CVD)

Indexed keywords

CHEMICAL REACTIONS--PHOTOCHEMICAL REACTIONS; INFRARED RADIATION--REFRACTION; SEMICONDUCTING SILICON; SPECTROSCOPY, INFRARED;

PHOTOCHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX;

SILICA;

EID: 0025446612     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.29.997     Document Type: Article

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