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Journal of Applied Physics

Volumn 59, Issue 5, 1986, Pages 1587-1595

Oxidation temperature dependence of the dc electrical conduction characteristics and dielectric strength of thin Ta2O5 films on silicon

(1) Oehrlein, G S a

a IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36549104227 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.336468 Document Type: Article

Times cited : (112)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.