Ellipsometric Examination of Growth and Dissolution Rates of Ta2O5 Films Formed by Metalorganic Chemical Vapor Deposition

Journal of the Electrochemical Society

Volumn 139, Issue 7, 1992, Pages 1956-1962

  An, Choon Ho ^a   Sugimoto, Katsuhisa ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; CHEMICAL VAPOR DEPOSITION; CORROSION RESISTANCE; CRYSTAL GROWTH; ELLIPSOMETRY; FILMS; ORGANOMETALLICS; TANTALUM COMPOUNDS;

METALLORGANIC CHEMICAL VAPOR DEPOSITION; PENTAMETOXY TANTALUM; TANTALUM OXIDES;

OXIDES;

EID: 0026897623     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2069529     Document Type: Article

References (41)

1. M. Ishikawa and K. Sugimoto, Boshoku Gijutsu, 38, 579 (1989).
2. P. Kofstad, Journal of the Electrochemical Society, 109, 776 (1962).
3. C. Hasimoto, II. Oikawa, and N. Honma, IEEE Trans. Electron Devices, ED-36, 14 (1989).
4. K. Ohta, K. Yamada, K. Shimizu, and Y. Tarui, IEEE Trans. Electron Devices, ED-29, 368 (1982).
5. A. G. Revesz, J. F. Allison, and J. H. Reynolds, Comsat. Tech. Rev., 6, 57 (1976).
6. D. H. Hensler, J. D. Cuthbert, R. J. Martin, and P. K. Tien, Appl. Opt., 10, 1037 (1971).
7. H. Terui and M. Kobayashi, Appl. Phys. Lett., 32, 666 (1978).
8. G. M. Choi, II. L. Tuller, and J. S. Haggerty, Journal of the Electrochemical Society, 136, 835 (1989).
9. E. Kaplan, M. Balog, and D. Frohman-Bentchowsky, Journal of the Electrochemical Society, 123, 1570 (1976).
10. P. S. Wilcox and W. D. Westwood, Can. J. Phys., 4, 1544 (1971).
11. W. H. Knausenberger and R. N. Tauber, Journal of the Electrochemical Society, 120, 927 (1973).
12. L. I. Maissel and R. Glang, Editors, “Handbook of Thin Films,” p. 17, McGraw-Hill, New York (1970).
13. G. S. Oehrlein, J. Appl. Phys., 59, 1587 (1986).
14. G. S. Oehrlein and A. Reisman, J. Appl. Phys., 54, 6502 (1983).
15. G. S. Oehrlein, F. M. d'lleurle, and A. Reisman, J. Appl. Phys., 55, 3715 (1984).
16. L. Young and D. J. Smith, Journal of the Electrochemical Society, 126, 765 (1979).
17. I. Montero, J. M. Albella, and J. M. Martinez-Duart, Journal of the Electrochemical Society, 132, 814 (1985).
18. J. P. S. Pringle, Journal of the Electrochemical Society, 119, 482 (1972).
19. Y. Nishioka, H. Shinriki and K. Mukai, Journal of the Electrochemical Society, 136, 872 (1989).
20. S. Roberts, J. Ryan and L. Nesbit, Journal of the Electrochemical Society, 133, 1405 (1986).
21. M. A. Mohammed and D. V. Morgan, Thin Solid Films, 176, 45 (1989).
22. T. Takahasi and H. Itoh, J. Less Common Metals, 38, 211 (1972).
23. D. J. Peacock, Electrochem. Technology, 4, 443 (1966).
24. C. C. Wang, K. H. Zaininger, and M. T. Duffy, RCA Review, 31, 728 (1970).
25. M. Saitoh, T. Mori, and H. Tamura, Int. Electron Device Meeting Tech. Dig., 680 (1986).
26. M. Okada, H. Fukaya and T. Ido, Denki Kagaku, 53, 109 (1985).
27. M. Ishikawa and K. Sugimoto, J. Jpn. Inst. Metals, 51, 1054 (1987).
28. M. Toyoda and K. Sugimoto, J. Jpn. Inst. Metals, 54, 925 (1990).
29. C. H. An and K. Sugimoto, J. Jpn. Inst. Metals, 55, 58 (1991).
30. H. Kiyota, Monthly Semiconductor World, 11, 103 (1986).
31. D. C. Bradely, W. Wardlaw and Whitley, J. Chem. Soc., 76, 3820 (1954).
32. R. M. A. Azzam and N. M. Bashara, “Ellipsometry and Polarized Light,” North-Holland, New York (1977).
33. S. Matsuda and K. Sugimoto, J. Jpn. Inst. Metals, 17, 798 (1978).
34. G. Gould and E. A. Irene, Journal of the Electrochemical Society, 136, 1108 (1989).
35. A. Kinbara and H. Fujiwara, “Thin Films,” p. 45, Syok-abo, Tokyo (1987).
36. Y. Hisamune, Y. Hokari, and K. Kobayashi, “Extended Abstracts of the 34th Spring Meeting of Japan Society Applied Physics,” p. 528 (1987).
37. N. T. McDevitt and W. L. Baun, J. Am. Ceram. Soc., 47, 622 (1964).
38. T. A. Sidorov, Tr. Fiz. Inst. Akad., Nauk USSR, 12, 236 (1960).
39. N. Terao, Jpn. J. Appl. Phys., 6, 21 (1967).
40. G. Brauer, H. Muller and G. Kuhner, J. Less Common Metals, 4, 533 (1962).
41. T. Go and K. Sugimoto, J. Jpn. Inst. Metals, 56, 184 (1992).