Growth of carbon nitride thin films by radio-frequency-plasma-enhanced chemical vapor deposition at low temperatures

Journal of Materials Research

Volumn 14, Issue 3, 1999, Pages 1153-1159

  Lim, S F ^a   Wee, A T S ^a   Lin, J ^a   Chua, D H C ^a   Tan, K L ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; AMORPHOUS MATERIALS; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; ETHANE; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; X RAY CRYSTALLOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE;

NITRIDES;

EID: 0033096809     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0153     Document Type: Article

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