Ion-beam bombarding effects on deposition of carbon nitride films by laser ablation

Chinese Physics Letters

Volumn 13, Issue 11, 1996, Pages 878-880

  Ying, Zhi Feng ^a   Ren, Zhong Min ^a   Du, Yuan Cheng ^a   Li, Fu Ming ^a   Lin, Jing ^a   Ren, Yun Zhu ^a   Zong, Xiang Fu ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; CARBON FILMS; CARBON NITRIDE; ION BEAM ASSISTED DEPOSITION; ION BEAMS; ION BOMBARDMENT; LASER ABLATION; NITROGEN; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON FILMS; CARBON NITRIDE FILMS; CN X FILMS; HIGH QUALITY; ION BEAM BOMBARDMENT; LASERS ABLATIONS; NITROGEN ION BEAM; POST TREATMENT; SYNTHESISED; X-RAY PHOTOELECTRONS;

AMORPHOUS FILMS;

EID: 0030327451     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/13/11/021     Document Type: Article

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