Anisotropic etching characteristics of platinum electrode for ferroelectric capacitor

IEEE Transactions on Electron Devices

Volumn 46, Issue 5, 1999, Pages 984-992

  Kim, Jin Hong ^a,b   Woo, Seong Ihl ^a   Nam, Byung Yun ^a   Yoo, Won Jong ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON MONOXIDE; CHLORINE; ELECTROCHEMICAL ELECTRODES; ETCHING; FERROELECTRIC DEVICES; PLATINUM;

FERROELECTRIC CAPACITORS; PLATINUM ETCHING;

CAPACITORS;

EID: 0032648337     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.760407     Document Type: Article

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