Chemical Dry Etching of Platinum Using Cl2/CO Gas Mixture

Chemistry of Materials

Volumn 10, Issue 11, 1998, Pages 3576-3582

  Kim, J H ^a   Woo, S I ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001027910     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm980337o     Document Type: Article

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