Negative ion densities in chlorine- and boron trichloride-containing inductively coupled plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 4, 1997, Pages 1955-1962

  Fleddermann, C B ^a,b   Hebner, G A ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b University of New Mexico   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BORON COMPOUNDS; CARRIER CONCENTRATION; CHLORINE; DENSITY MEASUREMENT (OPTICAL); ELECTRONS; INTERFEROMETERS; IONS; NITROGEN; PLASMAS;

BORON TRICHLORIDE; INDUCTIVELY COUPLED PLASMA; ION DENSITY; LASER PHOTODETACHMENT; MICROWAVE INTERFEROMETER;

MIXTURES;

EID: 0031188682     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580665     Document Type: Article

References (21)

1. See, for example, Y. Kusumi, N. Fujiwara, J. Matsumoto, and M. Yoneda, Jpn. J. Appl. Phys. 1 34, 2147 (1995).
2. R. A. Gottscho and C. E. Gaebe, IEEE Trans. Plasma Sci. PS-14, 92 (1986).
3. G. R. Scheller, R. A. Gottscho, T. Intrator, and D. B. Graves, J. Appl. Phys. 64, 4384 (1988).
4. L. J. Overzet and L. Luo, Appl. Phys. Lett. 59, 161 (1991).
5. F.-W. Breitbarth, Plasma Chem. Plasma Process. 12, 261 (1992).
6. J. A. Stockdale, D. R. Nelson, F. J. Davis, and R. N. Compton, J. Chem. Phys. 56, 3336 (1972).
7. Z. Lj. Petrovic, W. C. Wang, M. Suto, J. C. Han, and L. C. Lee, J. Appl. Phys. 67, 675 (1990).
8. R. Nagpal and A. Garscadden, Appl. Phys. Lett. 64, 1626 (1994).
9. D. L. Mosteller, Jr., M. L. Andrews, J. D. Clark, and A. Garscadden, J. Appl. Phys. 74, 2247 (1993).
10. P. A. Miller, G. A. Hebner, K. E. Greenberg, P. D. Pochan, and B. P. Aragon, J. Natl. Int. Standard. Technol. 100, 427 (1995).
11. P. J. Hargis, Jr., et al., Rev. Sci. Instrum. 65, 140 (1994).
12. G. A. Hebner, J. Vac. Sci. Technol. A 14, 2158 (1996).
13. K. E. Greenberg and G. A. Hebner, J. Appl. Phys. 73, 8126 (1993).
14. A. Mandl, Phys. Rev. A 14, 345 (1976).
15. H. M. Rosenstock, K. Draxl, B. W. Steiner, and J. T. Herron, J. Phys. Chem. Ref. Data 6, Supp. 1 (1977).
16. K. E. Greenberg, G. A. Hebner, and J. T. Verdeyen, Appl. Phys. Lett. 44, 299 (1984).
17. E. W. Rothe, B. P. Mathur, and G. P. Reck, Inorg. Chem. 19, 829 (1980).
18. G. A. Hebner, C. B. Fleddermann, and P. A. Miller, J. Vac. Sci. Technol. A (to be published).
19. R. M. Forrister and H. M. Anderson, Bull. Am. Phys. Soc. 40, 1556 (1995).
20. N. L. Bassett and D. J. Economou, J. Appl. Phys. 75, 1931 (1994).
21. B. J. Howard and C. Steinbruchel, J. Vac. Sci. Technol. A 12, 1259 (1994).