Ion chemistry in boron trichloride BCl3

Chemical Physics Letters

Volumn 265, Issue 1-2, 1997, Pages 239-243

  Jiao, C Q ^a,b   Nagpal, R ^a   Haaland, P ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b Mobium Enterprises Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031592441     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(96)01419-4     Document Type: Article

References (30)

1. [1] D.L. Flamm and V.M. Donnelly, Plasma Chem. Plasma Proc. 1 (1981) 317.
2. [2] J.W. Coburn, Plasma Chem. Plasma Proc. 2 (1982) 1.
3. [3] K.E. Greenberg, G.A. Hebner and J.T. Verdeyen, Appl. Phys. Lett. 44 (1984) 299.
4. [4] L.E. Kline, in: Nonequilibrium effects in ion and electron transport, eds. J.W. Gallagher, D.F. Hudson, E.E. Kunhardt and R.J. Van Brunt (Plenum, New York, 1990).
5. [5] A. Slaovi, F. Foulan, L. Fuchs, E. Foganassy and P. Siffert, Appl. Phys. A 50 (1990) 317.
6. [6] R.A. Gottscho, Phys. Rev. A 36 (1987) 2233.
7. [7] L.J. Overzet and L. Luo, Appl. Phys. Lett. 59 (1991) 161.
8. [8] J. Marriott and J.D. Craggs, J. Electron. Control 3 (1957) 194.
9. [9] Z. LJ. Petrovic, W.C. Wang, M. Suto, J.C. Han and L.C. Lee, J. Appl. Phys. 67 (1990) 675.
10. [10] I.S. Buchel'nikova, Sov. Phys. JETP 35 (1959) 783.
11. [11] R. Nagpal and A. Garscadden, Appl. Phys. Lett. 64 (1994) 1626.
12. [12] G.R. Scheller, R.A. Gottscho, T. Intrator and D.B. Graves, J. Appl. Phys. 64 (1988) 4384.
13. [13] Z.J. Jabbour, K.E. Martus and K. Becker, Z. Phys. D 9 (1988) 263.
14. [14] M. Suto, C. Ye, J.C. Han and L.C. Lee, J. Chem. Phys. 89 (1988) 6653.
15. [15] L.C. Lee, J.C. Han and M. Suto, J. Chem. Phys. 91 (1989) 2036.
16. [16] P.G. Gilbert, R.B. Siegel and K. Becker, Phys. Rev. A 41 (1990) 5594.
17. [17] F.W. Breitbarth, Plasma Chem. Plasma Proc. 12 (1992) 261.
18. [18] J.A. Stockdale, D.R. Nelson, F.J. Davis and R.N. Compton, J. Chem. Phys. 56 (1972) 3336.
19. [19] R.A. Gottshco and C.E. Gaebe, IEEE Trans. Plasma Sci. PS-14 (1986) 92.
20. [20] S. McGinnis, K. Rielh and P.D. Haaland, Chem. Phys. Lett. 232 (1994) 99.
21. [21] J. Holtgrave, K. Riehl, D. Abner and P.D. Haaland, Chem. Phys. Lett. 215 (1993) 548.
22. [22] P.D. Haaland, J. Chem. Phys. 93 (1990) 4066.
23. [23] K. Riehl, Collisional detachment of negative ions using FTMS, Ph.D. Thesis, Air Force Institute of Technology (1992).
24. [24] A.G. Marshall, T.L. Wang and T.L. Ricca, J. Am. Chem. Soc. 107 (1935) 7893.
25. [25] S. Guan, J. Chem. Phys. 91 (1989) 775.
26. [26] P.D. Haaland, Chem. Phys. Lett. 170 (1990) 146.
27. [27] R.C. Wetzel, F.A. Baiocchi, T.R. Hays and R.C. Freund, Phys. Rev. A 35 (1987) 559.
28. [28] E. Krishnakumar and S.K. Srivastava, J. Phys. B: At. Mol. Opt. Phys. 21 (1988) 1055.
29. [29] R.C. Weast, ed., CRC Handbook of Chemistry and Physics, 66th Ed. (CRC Press, Boca Raton, 1985).
30. [30] K. Tokunaga, F.C. Redeker, D.A. Danner and D.W. Hess, J. Electrochem. Soc. 128 (1981) 851.