Polycrystalline silicon thin films processed with silicon ion implantation and subsequent solid-phase crystallization: Theory, experiments, and thin-film transistor applications

Journal of Applied Physics

Volumn 75, Issue 7, 1994, Pages 3235-3257

  Yamauchi, Noriyoshi ^a   Reif, Rafael ^b  

^a NTT CORPORATION   (Japan)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0344683554     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.356131     Document Type: Article

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