The in situ characterization of metal film resistance during deposition

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 283-288

  Rycroft, I M ^a   Evans, B L ^a  

^a UNIVERSITY OF READING   (United Kingdom)

Author keywords

Ar ion beam sputtering; Resistance

Indexed keywords

ARGON; COPPER; ELECTRIC RESISTANCE MEASUREMENT; FILM GROWTH; IMAGE PROCESSING; ION BEAMS; IRON; MATHEMATICAL MODELS; PLATINUM; SPUTTER DEPOSITION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

EQUIVALENT RESISTORS;

METALLIC FILMS;

EID: 0030400153     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09181-X     Document Type: Article

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