Si-ULSI with a scaled-down future: Trends and challenges for ULSI semiconductor technology in the coming decade

IEEE Circuits and Devices Magazine

Volumn 14, Issue 2, 1998, Pages 19-29

  Vasudev, P K ^a,b   Zeitzoff, P M ^a  

^a SEMATECH   (United States)

^b NATIONAL INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; INTEGRATED CIRCUIT LAYOUT; MASKS; MICROPROCESSOR CHIPS; SILICON WAFERS;

CRITICAL DIMENSION CONTROL; SOFT X RAY PROJECTION LITHOGRAPHY;

ULSI CIRCUITS;

EID: 0032028255     PISSN: 87553996     EISSN: None     Source Type: Journal    
DOI: 10.1109/101.666588     Document Type: Article

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