Gate engineering for performance and reliability in deep-submicron CMOS technology

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1997, Pages 105-106

  Yu, Bin ^a   Ju, Dong Hyuk ^a   Kepler, Nick ^a   King, Tsu Jae ^a   Hu, Chenming ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; DIFFUSION IN SOLIDS; ENERGY GAP; GATES (TRANSISTOR); ION IMPLANTATION; LOGIC CIRCUITS; MOSFET DEVICES; NITROGEN; OXIDES; SEMICONDUCTING BORON; SEMICONDUCTOR DEVICE MODELS;

GATE MICROSTRUCTURE ENGINEERING; GATE OXIDES;

CMOS INTEGRATED CIRCUITS;

EID: 0030711772     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)