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Springer Series in Materials Science

Volumn 109, Issue , 2008, Pages 131-152

Modelling of Reactive Sputtering Processes

(3) Berg, Sören a Nyberg, Tomas a Kubart, Tomas a

a UPPSALA UNIVERSITY (Sweden)

Author keywords

Deposition Rate; Metal Atom; Partial Pressure; Reactive Sputtering; Target Surface

Indexed keywords

EID: 85072871154 PISSN: 0933033X EISSN: 21962812 Source Type: Book Series
DOI: 10.1007/978-3-540-76664-3_4 Document Type: Chapter

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.