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Thin Solid Films

Volumn 324, Issue 1-2, 1998, Pages 19-24

Magnetron sputtering of aluminium using oxygen or nitrogen as reactive gas

(2) Schulte, J a Sobe, G a

a IFW DRESDEN (Germany)

Author keywords

Aluminium; Coatings; Nitrogen; Sputtering

Indexed keywords

ALUMINUM COMPOUNDS; EMISSION SPECTROSCOPY; MAGNETRON SPUTTERING; MASS SPECTROMETRY; NITROGEN; OXYGEN;

ALUMINUM NITRIDE; REACTIVE GAS;

METALLIC FILMS;

EID: 0032122139 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)01197-8 Document Type: Article

Times cited : (29)

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