Computational modeling of reactive gas modulation in radio frequency reactive sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2231-2234

  Sekiguchi, Hidetoshi ^a   Murakami, Takashi ^a   Kanzawa, Atsushi ^a   Imai, Takahiro ^b   Honda, Takuya ^c  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TOPPAN PRINTING CO LTD   (Japan)

^c JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030494358     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580051     Document Type: Article

References (7)

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7. S. Berg, H-O. Blom, M. Moradi, C. Nender, and T. Larsson, J. Vac. Sci. Technol. A 7, 1225 (1989).