A universal etching-free transfer of MoS2 films for applications in photodetectors

Nano Research

Volumn 8, Issue 11, 2015, Pages 3662-3672

  Ma, Donglin ^a   Shi, Jianping ^a,b   Ji, Qingqing ^a   Chen, Ke ^a   Yin, Jianbo ^a   Lin, Yuanwei ^a   Zhang, Yu ^a,b   Liu, Mengxi ^a   Feng, Qingliang ^a   Song, Xiuju ^a   Guo, Xuefeng ^a   Zhang, Jin ^a   Zhang, Yanfeng ^a,b   Liu, Zhongfan ^a  

^a PEKING UNIVERSITY   (China)

^b PEKING UNIVERSITY   (China)

Author keywords

efficient transfer; environmental friendliness; etching free; MoS2; ultrasonic bubbling

Indexed keywords

EID: 84946493198     PISSN: 19980124     EISSN: 19980000     Source Type: Journal    
DOI: 10.1007/s12274-015-0866-z     Document Type: Article

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