-
1
-
-
77950580500
-
Phase change memory technology
-
G. Burr, M. Breitwisch, M. Franceschini, D. Garetto, K. Gopalakrishnan, B. Jackson, B. Kurdi, C. Lam, L. Lastras, A. Padillaet al. "Phase change memory technology," Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 28, p. 223, 2010
-
(2010)
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
, vol.28
, pp. 223
-
-
Burr, G.1
Breitwisch, M.2
Franceschini, M.3
Garetto, D.4
Gopalakrishnan, K.5
Jackson, B.6
Kurdi, B.7
Lam, C.8
Lastras, L.9
Padilla, A.10
-
2
-
-
84861089198
-
Nanoelectronic programmable synapses based on phase change materials for braininspired computing
-
D. Kuzum, R. Jeyasingh, B. Lee, and H.-S. P. Wong, "Nanoelectronic programmable synapses based on phase change materials for braininspired computing," Nano Letters, vol. 12, no. 5, pp. 2179-2186, 2011.
-
(2011)
Nano Letters
, vol.12
, Issue.5
, pp. 2179-2186
-
-
Kuzum, D.1
Jeyasingh, R.2
Lee, B.3
Wong, H.-S.P.4
-
3
-
-
79960855650
-
Programming algorithms for multilevel phase-change memory
-
N. Papandreou, H. Pozidis, A. Pantazi, A. Sebastian, M. Breitwisch, C. Lam, and E. Eleftheriou, "Programming algorithms for multilevel phase-change memory," in IEEE International Symposium on Circuits and Systems (ISCAS), 2011, pp. 329-332
-
(2011)
IEEE International Symposium on Circuits and Systems (ISCAS)
, pp. 329-332
-
-
Papandreou, N.1
Pozidis, H.2
Pantazi, A.3
Sebastian, A.4
Breitwisch, M.5
Lam, C.6
Eleftheriou, E.7
-
4
-
-
84885651650
-
Nanoscale electronic synapses using phase change devices
-
B. L. Jackson, B. Rajendran, G. S. Corrado, M. Breitwisch, G. W. Burr, R. Cheek, K. Gopalakrishnan, S. Raoux, C. T. Rettner, A. Padillaet al. "Nanoscale electronic synapses using phase change devices," ACM Journal on Emerging Technologies in Computing Systems (JETC), vol. 9, no. 2, p. 12, 2013.
-
(2013)
ACM Journal on Emerging Technologies in Computing Systems (JETC)
, vol.9
, Issue.2
, pp. 12
-
-
Jackson, B.L.1
Rajendran, B.2
Corrado, G.S.3
Breitwisch, M.4
Burr, G.W.5
Cheek, R.6
Gopalakrishnan, K.7
Raoux, S.8
Rettner, C.T.9
Padilla, A.10
-
5
-
-
50249177041
-
Physical interpretation, modeling and impact on phase change memory (PCM) reliability of resistance drift due to chalcogenide structural relaxation
-
D. Ielmini, S. Lavizzari, D. Sharma, and A. L. Lacaita, "Physical interpretation, modeling and impact on phase change memory (PCM) reliability of resistance drift due to chalcogenide structural relaxation," in IEEE Electron Devices Meeting (IEDM). IEEE, 2007, pp. 939-942.
-
(2007)
IEEE Electron Devices Meeting (IEDM). IEEE
, pp. 939-942
-
-
Ielmini, D.1
Lavizzari, S.2
Sharma, D.3
Lacaita, A.L.4
-
6
-
-
51549099818
-
Physical mechanism and temperature acceleration of relaxation effects in phase-change memory cells
-
D. Ielmini, D. Sharma, S. Lavizzari, and A. Lacaita, "Physical mechanism and temperature acceleration of relaxation effects in phase-change memory cells," in IEEE Reliability Physics Symposium (IRPS). IEEE, 2008, pp. 597-603.
-
(2008)
IEEE Reliability Physics Symposium (IRPS). IEEE
, pp. 597-603
-
-
Ielmini, D.1
Sharma, D.2
Lavizzari, S.3
Lacaita, A.4
-
7
-
-
79960609338
-
Physical origin of the resistance drift exponent in amorphous phase change materials
-
M. Boniardi and D. Ielmini, "Physical origin of the resistance drift exponent in amorphous phase change materials," Applied Physics Letters, vol. 98, no. 24, p. 243506, 2011.
-
(2011)
Applied Physics Letters
, vol.98
, Issue.24
, pp. 243506
-
-
Boniardi, M.1
Ielmini, D.2
-
8
-
-
67349157165
-
Reliability impact of chalcogenide-structure relaxation in phase-change memory (PCM) cells-part II: Physics-based modeling
-
S. Lavizzari, D. Ielmini, D. Sharma, and A. L. Lacaita, "Reliability impact of chalcogenide-structure relaxation in phase-change memory (PCM) cells-part II: Physics-based modeling," IEEE Transactions on Electron Devices, vol. 56, no. 5, pp. 1078-1085, 2009.
-
(2009)
IEEE Transactions on Electron Devices
, vol.56
, Issue.5
, pp. 1078-1085
-
-
Lavizzari, S.1
Ielmini, D.2
Sharma, D.3
Lacaita, A.L.4
-
9
-
-
0020497567
-
Activation energy spectra and relaxation in amorphous materials
-
M. Gibbs, J. Evetts, and J. Leake, "Activation energy spectra and relaxation in amorphous materials," Journal of Materials Science, vol. 18, no. 1, pp. 278-288, 1983.
-
(1983)
Journal of Materials Science
, vol.18
, Issue.1
, pp. 278-288
-
-
Gibbs, M.1
Evetts, J.2
Leake, J.3
-
10
-
-
63049116680
-
Relaxation kinetics of nanoscale indents in a polymer glass
-
A. Knoll, D. Wiesmann, B. Gotsmann, and U. Duerig, "Relaxation kinetics of nanoscale indents in a polymer glass," Physical Review Letters, vol. 102, no. 11, p. 117801, 2009.
-
(2009)
Physical Review Letters
, vol.102
, Issue.11
, pp. 117801
-
-
Knoll, A.1
Wiesmann, D.2
Gotsmann, B.3
Duerig, U.4
-
11
-
-
84899502995
-
Changes in electrical transport and density of states of phase change materials upon resistance drift
-
D. Krebs, T. Bachmann, P. Jonnalagadda, L. Dellmann, and S. Raoux, "Changes in electrical transport and density of states of phase change materials upon resistance drift," New Journal of Physics, vol. 16, no. 4, p. 043015, 2014.
-
(2014)
New Journal of Physics
, vol.16
, Issue.4
, pp. 043015
-
-
Krebs, D.1
Bachmann, T.2
Jonnalagadda, P.3
Dellmann, L.4
Raoux, S.5
-
12
-
-
49949133713
-
Temperature dependence of the energy gap in semiconductors
-
Y. Varshni, "Temperature dependence of the energy gap in semiconductors," Physica, vol. 34, no. 1, pp. 149-154, 1967.
-
(1967)
Physica
, vol.34
, Issue.1
, pp. 149-154
-
-
Varshni, Y.1
-
13
-
-
84865420155
-
Impact of DoS changes on resistance drift and threshold switching in amorphous phase change materials
-
D. Krebs, R. M. Schmidt, J. Klomfa? , J. Luckas, G. Bruns, C. Schlockermann, M. Salinga, R. Carius, and M. Wuttig, "Impact of DoS changes on resistance drift and threshold switching in amorphous phase change materials," Journal of Non-Crystalline Solids, vol. 358, no. 17, pp. 2412-2415, 2012.
-
(2012)
Journal of Non-Crystalline Solids
, vol.358
, Issue.17
, pp. 2412-2415
-
-
Krebs, D.1
Schmidt, R.M.2
Klomfa, J.3
Luckas, J.4
Bruns, G.5
Schlockermann, C.6
Salinga, M.7
Carius, R.8
Wuttig, M.9
-
14
-
-
84868360998
-
The influence of resistance drift on measurements of the activation energy of conduction for phase-change material in random access memory line cells
-
J. Oosthoek, D. Krebs, M. Salinga, D. Gravesteijn, G. Hurkx, and B. Kooi, "The influence of resistance drift on measurements of the activation energy of conduction for phase-change material in random access memory line cells," Journal of Applied Physics, vol. 112, no. 8, p. 084506, 2012.
-
(2012)
Journal of Applied Physics
, vol.112
, Issue.8
, pp. 084506
-
-
Oosthoek, J.1
Krebs, D.2
Salinga, M.3
Gravesteijn, D.4
Hurkx, G.5
Kooi, B.6
-
15
-
-
47249119179
-
Novel lithographyindependent pore phase change memory
-
M. Breitwisch, T. Nirschl, C. Chen, Y. Zhu, M. Lee, M. Lamorey, G. Burr, E. Joseph, A. Schrott, J. Philippet al. "Novel lithographyindependent pore phase change memory," in IEEE Symposium on VLSI Technology, 2007, pp. 100-101.
-
(2007)
IEEE Symposium on VLSI Technology
, pp. 100-101
-
-
Breitwisch, M.1
Nirschl, T.2
Chen, C.3
Zhu, Y.4
Lee, M.5
Lamorey, M.6
Burr, G.7
Joseph, E.8
Schrott, A.9
Philipp, J.10
-
16
-
-
70349987900
-
Endurance improvement of Ge2Sb2Te5-based phase change memory
-
C.-F. Chen, A. Schrott, M. Lee, S. Raoux, Y. Shih, M. Breitwisch, F. Baumann, E. Lai, T. Shaw, P. Flaitzet al. "Endurance improvement of Ge2Sb2Te5-based phase change memory," in IEEE International Memory Workshop, 2009, pp. 1-2.
-
(2009)
IEEE International Memory Workshop
, pp. 1-2
-
-
Chen, C.-F.1
Schrott, A.2
Lee, M.3
Raoux, S.4
Shih, Y.5
Breitwisch, M.6
Baumann, F.7
Lai, E.8
Shaw, T.9
Flaitz, P.10
-
17
-
-
84903999175
-
Crystal growth within a phase change memory cell
-
A. Sebastian, M. Le Gallo, and D. Krebs, "Crystal growth within a phase change memory cell," Nature communications, vol. 5, 2014.
-
(2014)
Nature Communications
, vol.5
-
-
Sebastian, A.1
Le Gallo, M.2
Krebs, D.3
-
18
-
-
37549051695
-
Fundamental drift of parameters in chalcogenide phase change memory
-
I. Karpov, M. Mitra, D. Kau, G. Spadini, Y. Kryukov, and V. Karpov, "Fundamental drift of parameters in chalcogenide phase change memory," Journal of Applied Physics, vol. 102, no. 12, pp. 124 503-124 503, 2007.
-
(2007)
Journal of Applied Physics
, vol.102
, Issue.12
, pp. 124503-124503
-
-
Karpov, I.1
Mitra, M.2
Kau, D.3
Spadini, G.4
Kryukov, Y.5
Karpov, V.6
-
19
-
-
84855543475
-
Band gap widening with time induced by structural relaxation in amorphous Ge2Sb2Te5 films
-
P. Fantini, S. Brazzelli, E. Cazzini, and A. Mani, "Band gap widening with time induced by structural relaxation in amorphous Ge2Sb2Te5 films," Applied Physics Letters, vol. 100, no. 1, p. 013505, 2012.
-
(2012)
Applied Physics Letters
, vol.100
, Issue.1
, pp. 013505
-
-
Fantini, P.1
Brazzelli, S.2
Cazzini, E.3
Mani, A.4
-
20
-
-
77954213882
-
Estimation of amorphous fraction in multilevel phase-change memory cells
-
N. Papandreou, A. Pantazi, A. Sebastian, E. Eleftheriou, M. Breitwisch, C. Lam, and H. Pozidis, "Estimation of amorphous fraction in multilevel phase-change memory cells," Solid-State Electronics, vol. 54, no. 9, pp. 991-996, 2010.
-
(2010)
Solid-State Electronics
, vol.54
, Issue.9
, pp. 991-996
-
-
Papandreou, N.1
Pantazi, A.2
Sebastian, A.3
Eleftheriou, E.4
Breitwisch, M.5
Lam, C.6
Pozidis, H.7
-
21
-
-
80655132012
-
Non-resistance-based cell-state metric for phase-change memory
-
A. Sebastian, N. Papandreou, A. Pantazi, H. Pozidis, and E. Eleftheriou, "Non-resistance-based cell-state metric for phase-change memory," Journal of Applied Physics, vol. 110, no. 8, pp. 084 505-084 505, 2011.
-
(2011)
Journal of Applied Physics
, vol.110
, Issue.8
, pp. 084505-084505
-
-
Sebastian, A.1
Papandreou, N.2
Pantazi, A.3
Pozidis, H.4
Eleftheriou, E.5
|