Study of the self-assembling of n-octylphosphonic acid layers on aluminum oxide

Langmuir

Volumn 24, Issue 23, 2008, Pages 13450-13456

  Hauffman, Tom ^a   Blajiev, Orlin ^a,b   Snauwaert, Johan ^a   Haesendonck, Chris Van ^a   Hubin, Annick ^a,b   Terryn, Herman ^a  

^a VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; ALUMINUM OXIDES; ATOMIC-FORCE MICROSCOPIES; GROWTH MECHANISMS; INTERPRETATION OF DATUM; ORGANIC MULTILAYERS; ROOT-MEAN-SQUARE ROUGHNESS; SELF-ASSEMBLING; X-RAY PHOTOELECTRON SPECTROSCOPIES; XPS;

ALUMINA; ALUMINUM; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; OXIDES; SURFACE TOPOGRAPHY;

X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM OXIDE; N OCTYLPHOSPHONIC ACID; N-OCTYLPHOSPHONIC ACID; PHOSPHONIC ACID DERIVATIVE;

ARTICLE; ARTIFICIAL MEMBRANE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; PARTICLE SIZE; SPECTROPHOTOMETRY; SURFACE PROPERTY; X RAY;

ALUMINUM OXIDE; MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; PARTICLE SIZE; PHOSPHONIC ACIDS; SPECTROPHOTOMETRY; SURFACE PROPERTIES; X-RAYS;

EID: 62649112531     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la801978a     Document Type: Article

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