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ACS Applied Materials and Interfaces

Volumn 5, Issue 9, 2013, Pages 3691-3696

Highly sensitive, patternable organic films at the nanoscale made by bottom-up assembly

(4) Zhou, Han a Blackwell, James M c Lee, Han Bo Ram b Bent, Stacey F b

a STANFORD UNIVERSITY (United States)

b Stanford University (United States)

c INTEL CORPORATION (United States)

Author keywords

molecular layer deposition; patterning; polyurea film; resolution; sensitivity

Indexed keywords

CHEMICALLY AMPLIFIED; HIGH-RESOLUTION PATTERNING; MOLECULAR LAYER DEPOSITION; MOLECULAR LAYER DEPOSITIONS (MLD); PATTERNING; POLYUREA FILM; SENSITIVITY; UREA COUPLING REACTIONS;

ATOMIC LAYER DEPOSITION; DEPOSITION; ELECTRON BEAM LITHOGRAPHY; OPTICAL RESOLVING POWER; THIN FILMS; UREA;

NANOTECHNOLOGY;

NANOMATERIAL; POLYMER; POLYUREA;

ARTICLE; CHEMISTRY; EQUIPMENT; METHODOLOGY; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY; TEMPERATURE; ULTRASTRUCTURE;

MICROSCOPY, ELECTRON, SCANNING; NANOSTRUCTURES; NANOTECHNOLOGY; POLYMERS; SURFACE PROPERTIES; TEMPERATURE;

EID: 84877321603 PISSN: 19448244 EISSN: 19448252 Source Type: Journal
DOI: 10.1021/am4002887 Document Type: Article

Times cited : (19)

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