Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 33, Issue 1, 2015, Pages

  Miikkulainen, Ville ^a,c   Nilsen, Ola ^a   Li, Han ^b   King, Sean W ^b   Laitinen, Mikko ^a   Sajavaara, Timo ^a   Fjellvåg, Helmer ^a  

^a UNIVERSITY OF OSLO   (Norway)

^b INTEL CORPORATION   (United States)

^c UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM COATINGS; ALUMINUM OXIDE; ATOMIC LAYER DEPOSITION; BORON COMPOUNDS; CRYSTALLINITY; DIFFUSION BARRIERS; LITHIUM COMPOUNDS; LOW-K DIELECTRIC; OXIDE FILMS; SOLID ELECTROLYTES; THIN FILMS;

ATOMIC LAYER DEPOSITED; CHEMICAL ENVIRONMENT; DEPOSITED MATERIALS; ELECTRONIC CONDUCTIVITY; ELEMENTAL COMPOSITIONS; LITHIUM-ION CONDUCTIVITY; LOW DIELECTRIC CONSTANTS; PULSING SEQUENCES;

THIN FILM LITHIUM ION BATTERIES;

EID: 84905012182     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4890006     Document Type: Article

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