SCOPUS 정보 검색 플랫폼

RSC Advances

Volumn 3, Issue 20, 2013, Pages 7537-7542

Atomic layer deposition of LixTiyOz thin films

(5) Miikkulainen, Ville a Nilsen, Ola a Laitinen, Mikko b Sajavaara, Timo b Fjellvåg, Helmer b

a UNIVERSITY OF OSLO (Norway)

b UNIVERSITY OF JYVÄSKYLÄ (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TEMPERATURES; FILM CHARACTERIZATIONS; LITHIUM CONTENT; OXYGEN SOURCES; POST DEPOSITION ANNEALING; TERT-BUTOXIDE; TITANIUM PRECURSORS; TITANIUM TETRACHLORIDES;

ATOMIC LAYER DEPOSITION; DEPOSITION; FILM GROWTH; TITANIUM;

LITHIUM;

EID: 84877275790 PISSN: None EISSN: 20462069 Source Type: Journal
DOI: 10.1039/c3ra40745d Document Type: Article

Times cited : (50)

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