Electroplating of Fe-rich NiFe alloys in sub-50 nm lines

Journal of the Electrochemical Society

Volumn 161, Issue 5, 2014, Pages

  Liang, D ^a,b   Liu, J ^a   Reuter, K ^a   Baker O'Neal, B ^a   Huang, Q ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b University of Virginia   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; ELECTROPLATING; FILLING; ROTATING DISKS;

ACCELERATION EFFECTS; GALVANOSTATICS; ORGANIC ADDITIVES; POTENTIAL TRANSIENTS; ROTATING DISK ELECTRODES; SINGLE-COMPONENT ADDITIVES; SLOW RELAXATIONS; TRENCH FILLINGS;

ADDITIVES;

EID: 84904822569     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.007406jes     Document Type: Article

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