Gold superfill in submicrometer trenches: Experiment and prediction

Journal of the Electrochemical Society

Volumn 153, Issue 1, 2006, Pages

  Josell, D ^a   Wheeler, D ^a   Moffat, T P ^a,b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; FABRICATION; MICROMETERS; MONOLAYERS; SEMICONDUCTING GALLIUM ARSENIDE;

AU DEPOSITION RATE; GOLD SUPERFILL; SUBMICROMETER TRENCHES;

GOLD;

EID: 30644471536     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2128765     Document Type: Article

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