Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7972, Issue , 2011, Pages

  Bozano, Luisa D ^a   Brock, Phillip J ^a   Truong, Hoa D ^a   Sanchez, Martha I ^a   Wallraff, Gregory M ^a   Hinsberg, William D ^a   Allen, Robert D ^a   Fujiwara, Masaki ^a   Maeda, Kazuhiko ^b  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b CENTRAL GLASS CO LTD   (Japan)

Author keywords

Bound PAG; Chemically amplified photoresists; E beam lithography; EUV

Indexed keywords

BOUND PAG; CHEMICALLY AMPLIFIED PHOTORESISTS; DESIGN STRATEGIES; E-BEAM LITHOGRAPHY; EUV; EUV LITHOGRAPHY; EUV RESISTS; EXPOSURE TOOL; FLUORO-POLYMERS; HIGH RESOLUTION; PERFORMANCE CHARACTERISTICS; PERFORMANCE COMPARISON; RELATIVE PERFORMANCE; RESIST POLYMERS;

ELECTRON BEAMS; ELECTRON OPTICS; EXTREME ULTRAVIOLET LITHOGRAPHY; FLUORINE CONTAINING POLYMERS; PHOTORESISTS; POLYMERS;

ELECTRON BEAM LITHOGRAPHY;

EID: 79955919023     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.884519     Document Type: Conference Paper

References (17)

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