Polymer photochemistry at the EUV wavelength

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Fedynyshyn, Theodore H ^a   Goodman, Russell B ^a   Cabral, Alberto ^a   Tarrio, Charles ^b   Lucatorto, Thomas B ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

EUV; Photoresist; polymer photochemistry

Indexed keywords

ABSORPTIVITIES; CHAIN SCISSION; EXTREME ULTRAVIOLET RADIATIONS; OPTICAL WAVELENGTH; PHOTOPRODUCTS; POLYMER PHOTOCHEMISTRY;

CHEMICAL REACTIONS; QUANTUM THEORY; QUANTUM YIELD;

ORGANIC POLYMERS;

EID: 77953503344     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.845997     Document Type: Conference Paper

References (9)

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2. Putna, E., S., Younkin, T., R., Chandhok, M. and Frasure, K., "EUV Lithography for 30nm Half Pitch and Beyond: Exploring Resolution, Sensitivity and LWR Tradeoffs," Proc. SPIE 7273, 72731L (2009).
3. Fedynyshyn, T., H., Goodman,R., B. and Roberts, J.,"Polymer Matrix Effects on Acid Generation," Proc. SPIE 6923, 692319, (2008).
4. Fedynyshyn, T., H., Kunz, R., R., Sinta, R., F., Goodman, R., B. and Doran, S., P., "Polymer Photochemistry at Three Advanced Optical Wavelengths", Forefront of Lithographic Materials Research: Proc. of International Conference on Photopolymers 12, 3 (2000).
5. Fedynyshyn, T., H., Kunz, R., R., Sinta, R., F., Goodman, R., B. and Doran, S., P., "Polymer photochemistry at advanced optical wavelengths," J. Vac. Sci. Technol. B 18, 3332 (2000).
6. "Product names or brands are mentioned only for experimental completeness. This does not constitute endorsement by NIST or the Federal Government."
7. Tarrio, C. and Grantham, S., "A synchrotron beamline for extreme-ultraviolet multilayer mirror endurance testing," Rev. Sci. Instrum. 76, 056101 (2005)
8. Tarrio, C., "Method for the characterization of extreme-ultraviolet photoresist outgassing," J. Res. NIST 114, 179 (2009).
9. Irie, S., Endo, M., Sasago, M., Kandaka, N., Kondo, H. and Murakami, K., "Measurement of resist transmittance at extreme ultraviolet wavelength using the extreme ultraviolet reflectometer," Jpn. J. Appl. Phys. 41, 4027 (2002).