Preliminary investigation of shot noise, dose, and focus latitude for E-Beam Direct Write

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8680, Issue , 2013, Pages

  Brodie, Alan ^a   Kojima, Shinichi ^a   McCord, Mark ^a   Grella, Luca ^a   Gubiotti, Thomas ^a   Bevis, Chris ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

Direct write; Ebeam; Electron; Electron beam; Lithography; Shot noise

Indexed keywords

DIRECT WRITE; DIRECT-WRITE LITHOGRAPHY; EBEAM; HIGH VOLUME MANUFACTURING; MULTIPLE PATTERNING; NUMBER OF ELECTRONS; PREDICTED PERFORMANCE; SEMICONDUCTOR MANUFACTURING;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRONS; LITHOGRAPHY; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGY;

SHOT NOISE;

EID: 84878397455     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2011908     Document Type: Conference Paper

References (4)

1. Petric, P., Bevis, C., McCord, M., Carroll, M., Brodie, A., Ummethala, U., Grella, L., Cheung, A. and Freed, A., "New advances with REBL for maskless high-throughput EBDW lithography", Proc. SPIE 7970 (2011)
2. Petric, P., Bevis, C., Brodie, A., Carroll, A., Cheung, A., Grella, L., McCord, M, Percy, H., Standiford, K. and Zywno, M., "REBL Nanowriter: Reflective Electron Beam Lithography", Proc. SPIE 7271 (2009)
3. Mack, C.A., Biafore, J.J. and Smith, M.D., "Stochastic acid-based quenching in chemically amplified photoresists: a simulation study", Proc SPIE 7972 (2011)
4. Kruit, P., Steenbrink, S., Jager, R. and Wieland, M., "Predicted effect of shot noise on contact hole dimension in e-beam lithography, JVST B24 2931-2935 (2006)