Investigation on growth behavior of multiphase silicon carbon film for front contact layer in a Si thin film solar cell

Solar Energy Materials and Solar Cells

Volumn 127, Issue , 2014, Pages 98-103

  Kim, Sun Ho ^a,b   You, Dong Joo ^a   Hwang, Sun Tae ^a   Lee, Hae Seok ^b   Lee, Sungeun ^a   Lee, Heon Min ^a   Kim, Donghwan ^b  

^a LG Electronics Inc   (South Korea)

^b Korea University   (South Korea)

Author keywords

Contact layer; Multiphase silicon carbon; PECVD; Si thin film solar cell

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS SILICON; CARBON FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE; SOLAR CELLS; THIN FILMS;

A-SI THIN FILM SOLAR CELLS; CONTACT LAYERS; HIGH ELECTRICAL CONDUCTIVITY; LOW ELECTRON TEMPERATURE; OPTICAL ABSORPTION COEFFICIENTS; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITIONS (PECVD); SILICON CARBON; THIN FILM SOLAR CELLS;

SILICON;

EID: 84899794578     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2014.03.054     Document Type: Article

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