Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 292-294

  Toal, S J ^a   Reehal, H S ^a   Webb, S J ^a   Barradas, N P ^b   Jeynes, C ^b  

^a LONDON SOUTH BANK UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

ECR plasma CVD; Raman Scattering; Silicon carbide; X ray diffraction

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CRYSTAL STRUCTURE; ENERGY GAP; HETEROJUNCTIONS; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON CARBIDE; SILICON SOLAR CELLS; THERMAL EFFECTS; THIN FILMS;

ELASTIC RECOIL DETECTION ANALYSIS (ERDA);

SEMICONDUCTING FILMS;

EID: 0032628698     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01585-5     Document Type: Article

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