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Volumn 53, Issue 1-2, 1998, Pages 189-203

Incorporation of p-type microcrystalline silicon films in amorphous silicon based solar cells in a superstrate structure

Author keywords

Amorphous silicon; Microcrystalline silicon; Solar cell; Tunnel junction

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS SILICON; BAND STRUCTURE; COMPUTER SIMULATION; CRYSTALLINE MATERIALS; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SEMICONDUCTOR JUNCTIONS; THIN FILMS; TUNNEL JUNCTIONS;

EID: 0032073861     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(98)00027-0     Document Type: Article
Times cited : (97)

References (21)
  • 8
    • 0347201536 scopus 로고    scopus 로고
    • Barcelona
    • After the submission of this paper further work was presented (S. Hamma, P. Roca i Cabarrocas, 14th EPVSEC, Barcelona (1997)) which shows that the incubation phase can be reduced down to ≈5 nm by layer-by-layer deposition.
    • (1997) 14th EPVSEC
    • Hamma, S.1    Roca I Cabarrocas, P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.