Site-specific atomic and electronic structure analysis of epitaxial silicon oxynitride thin film on SiC(0001) by photoelectron and auger electron diffractions

Journal of the Physical Society of Japan

Volumn 83, Issue 4, 2014, Pages

  Maejima, Naoyuki ^a   Matsui, Fumihiko ^a   Matsui, Hirosuke ^a   Goto, Kentaro ^a   Matsushita, Tomohiro ^b   Tanaka, Satoru ^c   Daimon, Hiroshi ^a  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^c KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84897499075     PISSN: 00319015     EISSN: 13474073     Source Type: Journal    
DOI: 10.7566/JPSJ.83.044604     Document Type: Article

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