SCOPUS 정보 검색 플랫폼

Volumn 552, Issue , 2014, Pages 196-203

Hexamethyldisiloxane thin films as sensitive coating for quartz crystal microbalance based volatile organic compounds sensors

(5) Boutamine, M a Bellel, A a Sahli, S a Segui, Y b Raynaud, P b

a Universite Mentouri Constantine (Algeria)

b Laboratoire Plasma et Conversion d'Energie (France)

Author keywords

Hexamethyldisiloxane; Plasma polymerization; Quartz crystal microbalance; Sensor; Volatile organic compounds

Indexed keywords

CHEMICAL AFFINITIES; CHEMICAL COMPOSITIONS; EFFECTIVE SPECIFIC SURFACE AREAS; HEXAMETHYL DISILOXANE; RESPONSE CHARACTERISTIC; SENSITIVE COATINGS; SENSOR SENSITIVITY; SURFACE WETTABILITY;

ATOMIC FORCE MICROSCOPY; COATINGS; ELECTRODES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FUNCTIONAL GROUPS; GAS CHROMATOGRAPHY; MIXTURES; PLASMA POLYMERIZATION; QUARTZ CRYSTAL MICROBALANCES; SCANNING ELECTRON MICROSCOPY; SENSORS; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; THIN FILMS; VAPORS; VOLATILE ORGANIC COMPOUNDS;

VAPOR DEPOSITION;

EID: 84892830577 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2013.12.016 Document Type: Article

Times cited : (41)

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