Fabrication of nano-porous silicon oxide layers by plasma polymerisation methods

Materials Letters

Volumn 61, Issue 8-9, 2007, Pages 1722-1724

  Chifen, Anye Ngu ^a   Knoll, Wolfgang ^a   Förch, Renate ^a  

^a MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

Author keywords

Heat treatment; Hexamethyl disiloxane; Nano pores; Nanomaterials; Plasma polymerisation; Thin films

Indexed keywords

HEAT TREATMENT; NANOPORES; PLASMA POLYMERIZATION; POLYMETHYL METHACRYLATES; POROUS SILICON; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

HEXAMETHYL DISILOXANE; SURFACE AREA-TO-VOLUME RATIO;

SILICA;

EID: 33847626410     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2006.07.118     Document Type: Article

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