Improvement of the polyimide surface wettability using SiOx films deposited in a DECR reactor from HMDSO/O2 mixtures

Plasma Processes and Polymers

Volumn 2, Issue 7, 2005, Pages 586-594

  Bellel, Azzedine ^a   Sahli, Salah ^a   Raynaud, Patrice ^b   Segui, Yvan ^b   Ziari, Zahira ^a   Eschaich, David ^b   Dennler, Gilles ^b  

^a Universite Mentouri Constantine   (Algeria)

^b UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

Atomic force microscopy (AFM); Contact angle (CA); Polymides; SiOx films; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; ELECTRON CYCLOTRON RESONANCE; MIXTURES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY; SURFACE TREATMENT; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CONTACT ANGLE MEASUREMENTS; DISTRIBUTED CYCLOTRON RESONANCE;

POLYIMIDES;

EID: 24344465877     PISSN: 16128850     EISSN: None     Source Type: Journal    
DOI: 10.1002/ppap.200500016     Document Type: Article

References (28)

1. M. K. Ghosh, K. L. Mittal, "Polyimides Fundamentals and application", Marcel Dekker, New York 1996.
2. D. Wilson, in: "Polyimides", D. Wilson, H. D. Stenzenberger, P. M. Hergenrother, Eds., Chapman and Hall, London 1990, p. 195.
3. H. Satou, H. Suzuki, D. Makino, in: "Polyimides", D. Wilson, H. D. Stenzenberger, P. M. Hergenrother, Eds., Chapman and Hall, London 1990, p. 228.
4. G. H. Yang, E. T. Kang, K. G. Neoh, Y. Zhang, K. L. Tan, Coll. Polym. Sci. 2001, 279, 745.
5. N. Cui, M. D. Brown, Appl. Surf. Sci. 2002, 189, 31.
6. S. Suzer, A. Argun, O. Vatansever, O. Oral, J. Appl. Polym. Sci. 1999, 74, 1846.
7. H. Hiraoka, S. Lasare, Appl. Surf. Sci. 1990, 46, 264.
8. D. Hegemann, H. Brunner, C. Oehr, Nucl. Instrum. Methods Phys. Res. B 2003, 208, 281.
9. A. C. Fozza, J. E. Klemberg-Sapieha, M. R. Wertheimer, Plasmas Polym. 1999, 4, 183.
10. F. Garbassi, M. Morra, E. Occhiello, L. Barino, R. Scordamaglia, Surf. Interface Anal. 1989, 14, 585.
11. E. Occhiello, M. Morra, G. Morini, F. Garbassi, P. Humphrey, J. Appl. Polym. Sci. 1991, 42, 551.
12. S. Sahli, S. Rebiai, P. Raynaud, Y. Segui, A. Zenasni, S. Mouissat, Plasmas Polym. 2002, 7, 327.
13. G. Dennler, A. Houdayer, P. Raynaud, I. Seguy, Y. Segui, M. R. Wertheimer, Plasmas Polym. 2003, 8, 43.
14. D. K. Owens, R. C. Wendt, J. Appl. Polym. Sci. 1969, 13, 1741.
15. E. Finot, S. Roualdes, M. Kirchner, V. Rouessac, R. Berjoan, J. Durand, J.-P. Goudonnet, L. Cot, Appl. Surf. Sci. 2002, 187, 326.
16. G. Beamson, D. Briggs, "High Resolution XPS of Organic Polymers", The Scienta ESCA300 database, 1st edition, J. Wiley & Sons, New York, Chichester, UK 1992.
17. Q. Lu, M. Li, J. Yin, Z. Zhu, Z. Wong, J. Appl. Polym. Sci. 2001, 82, 2739.
18. L. D. Eske, D. W. Galipeau, Colloids Surf. A 1999, 154, 33.
19. A. Zúňiga-Segundo, F. Ruiz, C. Vázquez-López, J. González-Hemández, G. Torres-Delgado, D. V. Tsu, J. Vac. Sci. Technol., A 1994, 12, 2572.
20. D. Hegemann, U. Voher, C. Oehr, R. Riedel, Surf. Coat. Technol. 1999, 116, 1033.
21. A. S. da Silva Sobrinho, N. Schühler, J. E. Klemberg-Sapieha, M. R. Wertheimer, M. Andrews, S. C. Gujrathi, J. Vac. Sci. Technol., A 1998, 16, 2021.
22. A. Bergeron, J. E. Klemberg-Sapieha, L. Martinu, J. Vac. Sci. Technol., A 1998, 16, 3227.
23. M. R. Alexander, R. D. Short, F. R. Jones, W. Michaeli, C. J. Blomfield, Appl. Surf. Sci. 1999, 137, 179.
24. M. Naddaf, C. Balasubramanian, P. S. Alegaonkar, V. N. Bhoraskar, A. B. Mandle, V. Ganeshan, S. V. Bhoraskar, Nucl. Instrum. Methods B 2004, 222, 135.
25. C. Gotoh, Y. Nakata, M. Tagawa, M. Tagawa, Colloids Surf. A 2003, 224, 165.
26. Z. Qin, J. Zhang, H. Zhou, Y. Song, T. He, Nucl. Instrum. Methods B 2000, 170, 406.
27. T. R. Gengenbach, H. J. Grisser, Polymer 1999, 40, 5079.
28. J. Schwarz, M. Schmidt, A. Ohl, Surf. Coat. Technol. 1998, 98, 859.