SiOx plasma thin film deposition using a lowerature cascade arc torch

Thin Solid Films

Volumn 519, Issue 15, 2011, Pages 4824-4829

  Ritts, A C ^a   Liu, C H ^b   Yu, Q S ^a  

^a University of Missouri   (United States)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Cascade arc torch; Hardness; Hexamethyldisiloxane; Plasma deposition; Refractive index; X ray photoelectron spectroscopy

Indexed keywords

CASCADE ARC TORCH; FILM HARDNESS; FOURIER TRANSFORM INFRARED; HEXAMETHYL DISILOXANE; LENS MATERIALS; PLASMA COATING; PLASMA SYSTEMS; PLASMA THIN FILM; PLASTIC GLASS; SURFACE CONTACT ANGLE; WATER CONTACT ANGLE MEASUREMENT;

ANGLE MEASUREMENT; CONTACT ANGLE; DEPOSITION; FOURIER TRANSFORMS; GAS MIXTURES; GASES; HARD COATINGS; HARDNESS; INDUSTRIAL APPLICATIONS; LIGHT REFRACTION; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTONS; PLASMAS; PLASTIC COATINGS; PLASTIC LENSES; REFRACTIVE INDEX; REFRACTOMETERS; SILICON COMPOUNDS; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA DEPOSITION;

EID: 79957643970     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.037     Document Type: Conference Paper

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