Characterization on polymerized thin films for low-k insulator using PECVD

Progress in Organic Coatings

Volumn 61, Issue 2-4, 2008, Pages 245-248

  Bae, I S ^a   Cho, S J ^a   Choi, W S ^b   Cho, H J ^a   Hong, B ^a   Jeong, H D ^c   Boo, J H ^a  

^a Sungkyunkwan University   (South Korea)

^b Hanbat National University   (South Korea)

^c Chonnam National University   (South Korea)

Author keywords

Dielectric constant; PECVD; Plasma polymerization

Indexed keywords

CHARACTERIZATION; FILM GROWTH; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; SUBSTRATES;

CARRIER GASES; MODULUS MEASUREMENTS; POLYMERIZED THIN FILMS; SILICON SUBSTRATES;

POLYMER FILMS;

EID: 38749084914     PISSN: 03009440     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.porgcoat.2007.09.031     Document Type: Article

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