Conducting Nb-doped TiO2 thin films fabricated with an atomic layer deposition technique

Thin Solid Films

Volumn 551, Issue , 2014, Pages 19-22

  Niemelä, Janne Petteri ^a   Yamauchi, Hisao ^a   Karppinen, Maarit ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

Atomic layer deposition; Conducting oxide; Nb doped TiO2; Transport properties

Indexed keywords

ANATASE STRUCTURES; CONDUCTING OXIDES; GLASS SUBSTRATES; POLYCRYSTALLINE FILM; POST DEPOSITION ANNEALING; RESISTIVITY MEASUREMENT; ROOM-TEMPERATURE RESISTIVITY; TIO;

CONDUCTIVE FILMS; DEPOSITION; ELECTRIC PROPERTIES; ELECTRON TRANSPORT PROPERTIES; GLASS; NIOBIUM OXIDE; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION;

EID: 84891743763     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.11.043     Document Type: Article

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