Atomic layer deposition of Ta-doped TiO2 electrodes for dye-sensitized solar cells

Journal of the Electrochemical Society

Volumn 158, Issue 6, 2011, Pages

  Choi, Ji Hwan ^a   Kwon, Se Hun ^a   Jeong, Young Keun ^a   Kim, Il ^a   Kim, Kwang Ho ^a  

^a Pusan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DOPED-TIO; DYE-SENSITIZED SOLAR CELL; DYE-SENSITIZED SOLAR CELLS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; INVERSE OPAL; INVERSE-OPAL STRUCTURE; PHOTOCONVERSION EFFICIENCY; PHOTOCURRENT DENSITY; SELECTIVE ETCHING; SILICA TEMPLATES; STEP COVERAGE; TA CONTENT; TIO;

ATOMIC LAYER DEPOSITION; ATOMS; ENAMELS; PHOTOELECTROCHEMICAL CELLS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SILICA; SILICATE MINERALS; SOLAR CELLS;

TANTALUM;

EID: 79955525837     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3582765     Document Type: Article

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