Niobium doped TiO2: Intrinsic transparent metallic anatase versus highly resistive rutile phase

Journal of Applied Physics

Volumn 102, Issue 1, 2007, Pages

  Zhang, S X ^a   Kundaliya, D C ^a   Yu, W ^a   Dhar, S ^a   Young, S Y ^b   Salamanca Riba, L G ^b   Ogale, S B ^a   Vispute, R D ^a   Venkatesan, T ^a  

^a Bldg 142   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; FILM GROWTH; LIGHT ABSORPTION; NIOBIUM; PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS;

ABSORPTION EDGE; METALLIC PROPERTY; RUTILE PHASES;

TITANIUM DIOXIDE;

EID: 34547220431     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2750407     Document Type: Article

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