SCOPUS 정보 검색 플랫폼

Volumn 90, Issue 21, 2007, Pages

Fabrication of highly conductive Ti1-x Nbx O2 polycrystalline films on glass substrates via crystallization of amorphous phase grown by pulsed laser deposition

(8) Hitosugi, T a Ueda, A b Nakao, S b Yamada, N b Furubayashi, Y b Hirose, Y b Shimada, T c Hasegawa, T c

a UNIVERSITY OF TOKYO (Japan)

b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY (Japan)

c NONE

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; OPACITY; PULSED LASER DEPOSITION; THIN FILMS; TRANSPARENCY;

AMORPHOUS PHASE; INDIUM TIN OXIDE; POLYCRYSTALLINE FILMS;

POLYCRYSTALLINE MATERIALS;

EID: 34249748455 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2742310 Document Type: Article

Times cited : (144)

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