Structural, electrical and optical properties of sputter-deposited Nb-doped TiO2 (TNO) polycrystalline films

Thin Solid Films

Volumn 516, Issue 17, 2008, Pages 5754-5757

  Yamada, Naoomi ^a   Hitosugi, Taro ^a,b   Hoang, Ngoc Lam Huong ^a,b   Furubayashi, Yutaka ^a   Hirose, Yasushi ^a   Konuma, Seiji ^a   Shimada, Toshihiro ^a,b   Hasegawa, Tetsuya ^a,b  

^a KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

Anatase; Nb doped TiO2; Polycrystalline films; Post annealing; Sputtering; TNO; Transparent conductive oxide

Indexed keywords

CARRIER TRANSPORT; ELECTRIC CONDUCTIVITY; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; TITANIUM DIOXIDE;

POLYCRYSTALLINE FILMS; POST-ANNEALING; TRANSPARENT CONDUCTIVE OXIDES;

THIN FILMS;

EID: 44249087851     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.036     Document Type: Article

References (13)

1. Ginley D.S., and Bright C. Mater. Res. Bull. 25 (2000) 15
2. Chopra K.L., Major S., and Pandya D.K. Thin Solid Films 102 (1983) 1
3. Furubayashi Y., Hitosugi T., Yamamoto Y., Kinoda K., Kinoda G., Hirose Y., Shimada T., and Hasegawa T. Appl. Phys. Lett. 86 (2005) 252101
4. Hitosugi T., Furubayashi Y., Ueda A., Itabashi K., Inaba K., Hirose Y., Kinoda G., Yamamoto Y., Shimada T., and Hasegawa T. Jpn. J. Appl. Phys. 44 (2005) L1063
5. Furubayashi Y., Hitosugi T., Yamamoto Y., Hirose Y., Kinoda G., Inaba K., Shimada T., and Hasegawa T. Thin Solid Films 496 (2006) 157
6. Furubayashi Y., Hitosugi T., and Hasegawa T. Appl. Phys. Lett. 88 (2006) 226103
7. Hitosugi T., Ueda A., Furubayashi Y., Hirose Y., Konuma S., Shimada T., and Hasegawa T. Jpn. J. Appl. Phys. 46 (2007) L86
8. Hitosugi T., Ueda A., Nakao S., Yamada N., Furubayashi Y., Hirose Y., Shimada T., and Hasegawa T. Appl. Phys. Lett. 90 (2007) 212106
9. Gillispie M.A., van Hest M.F.M., Dabney M.S., Perkins J.D., and Ginley D.S. J. Appl. Phys. 101 (2007) 033125
10. Yamada N., Hitosugi T., Hoang N.L.H., Furubayashi Y., Hirose Y., Shimada T., and Hasegawa T. Jpn. J. Appl. Phys. 46 (2007) 5275
11. Shiller S., Beister G., Schneider S., and Seiber W. Thin Solid Films 72 (1980) 475
12. Löbl P., Huppertz M., and Mergel D. Thin Solid Films 251 (1994) 72
13. Jellison Jr. G.E., Boatner L.A., Budai J.D., Jeong B.-S., and Norton D.P. J. Appl. Phys. 93 (2003) 9537