SCOPUS 정보 검색 플랫폼

Journal of Electron Spectroscopy and Related Phenomena

Volumn 190, Issue PART B, 2013, Pages 235-241

Application of hard X-ray photoelectron spectroscopy to electronic structure measurements for various functional materials

(1) Ueda, S a

a NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

Author keywords

Bulk sensitive electronic structure; Buried interfaces; Functional materials; Hard X ray photoelectron spectroscopy; HAXPES

Indexed keywords

BEAM LINES; BURIED INTERFACE; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; HARD X-RAY PHOTOEMISSION; HAX-PES; NATIONAL INSTITUTE FOR MATERIALS SCIENCE; SPRING-8; STRUCTURE MEASUREMENT;

ELECTRONIC STRUCTURE; FUNCTIONAL MATERIALS; PHOTOELECTRONS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

INTERFACES (MATERIALS);

EID: 84890114235 PISSN: 03682048 EISSN: None Source Type: Journal
DOI: 10.1016/j.elspec.2013.01.009 Document Type: Article

Times cited : (90)

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