Hafnium oxide thin film grown by ALD: An XPS study

Surface Science Spectra

Volumn 14, Issue 1-4, 2007, Pages 34-40

  Barreca, Davide ^a   Milanov, Andrian ^b   Fischer, Roland A ^b   Devi, Anjana ^b   Tondello, Eugenio ^a  

^a UNIVERSITY OF PADOVA   (Italy)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

ALD; HfO2; Thin film; X ray Photoelectron Spectroscopy

Indexed keywords

ALD; HAFNIUM OXIDE THIN FILMS; HFO2; OXIDE THIN FILMS; OXIDIZING AGENTS; PREPARATION PROCESS; SI (100) SUBSTRATE; XPS CHARACTERIZATION;

ATOMIC LAYER DEPOSITION; COATINGS; HAFNIUM; PHOTOELECTRONS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

HAFNIUM OXIDES;

EID: 77951550776     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/11.20080401     Document Type: Article

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